Patent · US Expired

Semiconductor laser device and fabrication method thereof

US6625189B1 · kind B1 · utility

3Cited by
2References
14Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 8, 2000
Grant dateSep 23, 2003
Priority date
Expiry dateMar 8, 2020

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01S5/3434
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A semiconductor laser device includes an InP substrate and a multi-layered structure formed on the InP substrate, wherein the multi-layered structure includes at least a plurality of active regions for outputting a laser beam, and the plurality of active regions each are provided in each of a plurality of grooves dented toward the InP substrate.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.