Exposure apparatus, method for exposure, and method for manufacturing semiconductor device
US6628371B1 · kind B1 · utility
20Cited by
13References
25Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Oct 5, 2000 |
| Grant date | Sep 30, 2003 |
| Priority date | — |
| Expiry date | Nov 23, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03B27/72
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Changes transmittance of an optical system used to expose a substrate are determined and used to control an exposure quantity of exposing light that is provided to the substrate. For example, the transmittance is measured before and after exposure of one surface in order to control the exposure quantity that is to be used to expose another surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.