Exposure apparatus and device manufacturing method including gas purging of a space containing optical components
US6630985B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jun 13, 2002 |
| Grant date | Oct 7, 2003 |
| Priority date | — |
| Expiry date | Jun 13, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70883
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus includes an illumination optical system for illuminating an original with an F2 excimer laser, a projection optical system for projecting a pattern of the original onto a substrate to be exposed, a gas purging device for replacing a gas in an inside space, which accommodates optical components of at least one of the illumination optical system and the projection optical system, with a dry gas, a hygrometer, disposed in the inside space, for measuring conditions in the inside space and for producing an output, and a controller for controlling the gas purging device on the basis of the output of the hygrometer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.