Screening method for double pass screening
US6631675B2 · kind B2 · utility
1Cited by
7References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 27, 2001 |
| Grant date | Oct 14, 2003 |
| Priority date | — |
| Expiry date | Jul 20, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K2203/1476
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A screening mask for screening an article, the screening mask including a screening mask body having a screening side and a nonscreening side, an one opening through the mask for screening at least one feature from the screening side to the nonscreening side, and a blind opening for protecting a previously screened feature. The blind opening is blocked on the screening side and open on the nonscreening side. The screening mask is used in double pass screening so that a second feature may be formed on the article without damaging a previously formed feature.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.