Pattern formation material and pattern formation method
US6632582B2 · kind B2 · utility
6Cited by
1References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 19, 2001 |
| Grant date | Oct 14, 2003 |
| Priority date | — |
| Expiry date | Apr 19, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/146
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A pattern formation material contains a base polymer including a siloxane compound represented by Chemical Formula 1: wherein R1 are the same or different compounds selected from the group consisting of an alkyl compound, an ester compound, an ether compound, a sulfone compound, a sulfonyl compound and an aromatic compound.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.