Shinji Kishimura
57Patents
8h-index
26Co-inventors
74Inventor score
Filing activity: Dec 5, 1990 → Dec 20, 2006
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5123998A | Method of forming patterns | Physics | 15 | Expired |
| US6511787B2 | Polymers, resist compositions and patterning process | Emerging Cross-Sectional Technologies | 14 | Expired |
| US5591654A | Method of manufacturing a semiconductor device and a resist composition used therein | Emerging Cross-Sectional Technologies | 11 | Expired |
| US6875556B2 | Resist compositions and patterning process | Emerging Cross-Sectional Technologies | 10 | Expired |
| US6710148B2 | Polymers, resist compositions and patterning process | Physics | 9 | Expired |
| US7067231B2 | Polymers, resist compositions and patterning process | Emerging Cross-Sectional Technologies | 9 | Expired |
| US6916592B2 | Esters, polymers, resist compositions and patterning process | Emerging Cross-Sectional Technologies | 9 | Expired |
| US7125641B2 | Polymers, resist compositions and patterning process | Physics | 9 | Expired |
| US6582880B2 | Polymers, resist compositions and patterning process | Emerging Cross-Sectional Technologies | 8 | Expired |
| US6124081A | Method of forming a resist pattern | Physics | 8 | Expired |
| US7125643B2 | Polymers, resist compositions and patterning process | Emerging Cross-Sectional Technologies | 7 | Expired |
| US6864037B2 | Polymers, resist compositions and patterning process | Emerging Cross-Sectional Technologies | 6 | Expired |
| US6632582B2 | Pattern formation material and pattern formation method | Emerging Cross-Sectional Technologies | 6 | Expired |
| US6872514B2 | Polymers, resist compositions and patterning process | Emerging Cross-Sectional Technologies | 5 | Expired |
| US5217851A | Pattern forming method capable of providing an excellent pattern of high resolution power and high sensitivity | Physics | 5 | Expired |
| US5426016A | Method of forming and removing resist pattern | Physics | 5 | Expired |
| US7078147B2 | Polymers, resist compositions and patterning process | Emerging Cross-Sectional Technologies | 4 | Expired |
| US5252433A | Method of forming and removing resist pattern | Physics | 4 | Expired |
| US6528240B1 | Pattern formation method | Emerging Cross-Sectional Technologies | 3 | Expired |
| US7169530B2 | Polymer compound, resist material and pattern formation method | Emerging Cross-Sectional Technologies | 3 | Expired |
| US6521393B1 | Pattern formation method | Emerging Cross-Sectional Technologies | 3 | Expired |
| US6475706B1 | Pattern formation method | Emerging Cross-Sectional Technologies | 3 | Expired |
| US7125642B2 | Sulfonates, polymers, resist compositions and patterning process | Emerging Cross-Sectional Technologies | 3 | Expired |
| US6861197B2 | Polymers, resist compositions and patterning process | Emerging Cross-Sectional Technologies | 2 | Expired |
| US7060775B2 | Polymer compound, resist material and pattern formation method | Physics | 2 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.