Liquid treatment system and liquid treatment method
US6634370B2 · kind B2 · utility
3Cited by
5References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 7, 2001 |
| Grant date | Oct 21, 2003 |
| Priority date | — |
| Expiry date | May 26, 2021 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC25D7/123
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Liquid treatment units are disposed in multi-tiers surrounding a main-arm 35. Among liquid treatment units, plating units M1 through M4 are disposed on a lower tier side, and a unit for post-treatment process such as a cleaning unit 70 where a cleaner atmosphere is necessary is disposed on an upper tier side. Thereby, an improvement in an area efficiency and the formation and maintenance of a clean atmosphere can be simultaneously obtained.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.