Tomographic wavefont analysis system and method of mapping an optical system
US6634750B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 13, 2002 |
| Grant date | Oct 21, 2003 |
| Priority date | — |
| Expiry date | Jun 13, 2022 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61B3/0091
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method of measuring aberrations of a three-dimensional structure of an optical system, such as an eye, includes creating a plurality of light beams, optically imaging the light beams and projecting the light beams onto different locations in an optical system, receiving scattered light from each of the locations, and detecting individual wavefronts of the scattered light. The plurality of light beams may be created and projected simultaneously or sequentially. A system for measuring aberrations of a three-dimensional structure of an optical system includes a light source creating a plurality of light beams, an optical imaging system optically imaging the light beams and projecting the light beams onto different locations in the target optical system, and a wavefront sensor receiving scattered light from each of the locations and detecting individual wavefronts of the scattered light.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.