Tandem process chamber
US6635115B1 · kind B1 · utility
447Cited by
31References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 19, 2000 |
| Grant date | Oct 21, 2003 |
| Priority date | — |
| Expiry date | May 19, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67201
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The present invention provides an apparatus for vacuum processing generally comprising an enclosure having a plurality of isolated chambers formed therein, a gas distribution assembly disposed in each processing chamber, a gas source connected to the plurality of isolated chambers, and a power supply connected to each gas distribution assembly.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.