Fabricating optical elements using a photoresist formed using of a gray level mask
US6638667B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 3, 2002 |
| Grant date | Oct 28, 2003 |
| Priority date | — |
| Expiry date | Jun 3, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/50
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Gray scale masks used to create optical elements are formed. Desired gray scale patterns may be created by varying a transmission across a mask, e.g., by varying the thickness of a light absorbing layer. Such variations in thickness may be created using multiple binary masks. Desired gray scale patterns may also be created on a computer using available software and then imaged onto film or a glass film plate. Direct contact or proximity printing is then used to transfer the true gray scale pattern onto a photoresist layer. The photoresist layer is then etched, thereby forming the desired pattern therein. All portions of the desired pattern are simultaneously formed in the photoresist layer. The etched photoresist layer is then used to photolithographically fabricate either the optical element itself or a master element to be used in injection molding or other replication techniques. The gray scale mask itself may be used repeatedly to generate photoresist layers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.