William Delaney
7Patents
5h-index
12Co-inventors
60Inventor score
Filing activity: Dec 9, 1991 → Sep 5, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6071652A | Fabricating optical elements using a photoresist formed from contact printing of a gray level mask | Physics | 79 | Expired |
| US6420073B1 | Fabricating optical elements using a photoresist formed from proximity printing of a gray level mask | Physics | 23 | Expired |
| US6638667B2 | Fabricating optical elements using a photoresist formed using of a gray level mask | Physics | 20 | Expired |
| US5160959A | Device and method for the alignment of masks | Physics | 18 | Expired |
| US5298988A | Technique for aligning features on opposite surfaces of a substrate | Electricity | 16 | Expired |
| US11275031B2 | Porous waveguide sensors featuring high confinement factors and method for making the same | Physics | 0 | Active |
| US6869754B2 | Transfer of optical element patterns on a same side of a substrate already having a feature thereon | Physics | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.