Method and a system for identifying gaseous effluents, and a facility provided with such a system
US6643014B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 19, 2000 |
| Grant date | Nov 4, 2003 |
| Priority date | — |
| Expiry date | Jan 19, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/68
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The invention relates to a gas analysis system for analyzing gases in an enclosure under controlled pressure, which system comprises apparatus for ionizing the gases to be analyzed, and apparatus for analyzing the ionized gases. According to the invention the apparatus for ionizing the gases to be analyzed comprises a dedicated plasma source in contact with the gases contained in the enclosure and combined with a generator for generating a plasma from the gases to be analyzed; and the apparatus for analyzing the ionized gases comprises a radiation sensor situated in the vicinity of the zone in which the plasma is generated, and connected to an optical spectrometer for analyzing the variation of the radiation spectrum emitted by the generated plasma.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.