Patent · US Expired

System for fabricating a metal/anti-reflective coating/insulator/metal (MAIM) capacitor

US6645804B1 · kind B1 · utility

0Cited by
2References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 1, 2002
Grant dateNov 11, 2003
Priority date
Expiry dateMay 1, 2022

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10D84/212

Abstract

Disclosed is a system for fabricating an integrated circuit capacitor (100). An electrode layer (102) is formed in the integrated circuit. An anti-reflective coating (108) is deposited over the electrode layer (102). An electrode top plate (104) is formed over the anti-reflective coating (108).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.