System for fabricating a metal/anti-reflective coating/insulator/metal (MAIM) capacitor
US6645804B1 · kind B1 · utility
0Cited by
2References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 1, 2002 |
| Grant date | Nov 11, 2003 |
| Priority date | — |
| Expiry date | May 1, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D84/212
Abstract
Disclosed is a system for fabricating an integrated circuit capacitor (100). An electrode layer (102) is formed in the integrated circuit. An anti-reflective coating (108) is deposited over the electrode layer (102). An electrode top plate (104) is formed over the anti-reflective coating (108).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.