Differential detector coupled with defocus for improved phase defect sensitivity
US6646281B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 7, 2002 |
| Grant date | Nov 11, 2003 |
| Priority date | — |
| Expiry date | Mar 7, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/95676
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Provided are apparatus and methods for detecting phase defects. The invention relies generally on the distortion of light as it passes through defects in phase shift masks to detect these defects. Light traveling through a defect, such as a bump in an etched area will travel at a different rate than light traveling through air. In order to enhance the signals generated from the defects, the invention in several embodiments provides a defocused light inspection beam by setting the focus of the beam to a level above or below the photomask subject to inspection. The light from the photomask is collected by a detector split into at least two portions, each generating a signal. A resulting differential signal produced from the signals generated at each of the two detector portions is used to determine whether a defect in the photomask is present, in one embodiment, by generating an image from the resulting signal.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.