Patent · US Expired

Production of a dense mist of micrometric droplets in particular for extreme UV lithography

US6647088B1 · kind B1 · utility

17Cited by

11References

12Claims

0Family size

Assignee

COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES · FR

Inventors

Martin Schmidt · Brookline, US
Olivier Sublemontier · Fontenay-aux-Roses, FR

Key dates

Filing date	Apr 12, 2002
Grant date	Nov 11, 2003
Priority date	—
Expiry date	Apr 12, 2022

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10S977/951
WIPO fieldMedical technology
WIPO sectorInstruments

Abstract

Process and device for the generation of a fog of micrometric and submicrometric droplets, which may find application to the generation of light in the extreme ultraviolet range, particularly for lithography. According to the process and device, a pressurized liquid is injected into a very small diameter nozzle opening up into a vacuum. Light is generated by focusing laser radiation onto the fog.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.