Method of manufacturing photomask
US6649310B2 · kind B2 · utility
18Cited by
6References
60Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 29, 2001 |
| Grant date | Nov 18, 2003 |
| Priority date | — |
| Expiry date | Aug 30, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70625
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of manufacturing a photomask includes determining an average value of dimensions of a pattern in a photomask. determining an in-plane uniformity of the dimensions, determining an exposure latitude on the basis of the average value and the in-plane uniformity. The exposure latitude depends on dimensional accuracy of the pattern. Judging if the photomask is defective or non-defective is made on the basis of whether or not the exposure latitude falls within a prescribed exposure latitude
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.