Inventor · Yokohama, JP

Shigeki Nojima

37Patents
7h-index
42Co-inventors
69Inventor score

Filing activity: Aug 27, 1999 → Feb 28, 2019

Most-cited inventions

PatentTitleAreaCited byStatus
US6334209A Method for exposure-mask inspection and recording medium on which a program for searching for portions to be measured is recorded Physics 37 Expired
US7194704B2 Design layout preparing method Electricity 33 Expired
US6649310B2 Method of manufacturing photomask Physics 18 Expired
US7571417B2 Method and system for correcting a mask pattern design Physics 13 Active
US7526748B2 Design pattern data preparing method, mask pattern data preparing method, mask manufacturing method, semiconductor device manufacturing method, and program recording medium Physics 11 Expired
US7278125B2 Semiconductor integrated circuit pattern verification method, photomask manufacturing method, semiconductor integrated circuit device manufacturing method, and program for implementing semiconductor integrated circuit pattern verification method Physics 10 Expired
US7090949B2 Method of manufacturing a photo mask and method of manufacturing a semiconductor device Physics 7 Expired
US6727026B2 Semiconductor integrated circuit patterns Electricity 7 Expired
US7213226B2 Pattern dimension correction method and verification method using OPC, mask and semiconductor device fabricated by using the correction method, and system and software product for executing the correction method Physics 7 Expired
US7337426B2 Pattern correcting method, mask making method, method of manufacturing semiconductor device, pattern correction system, and computer-readable recording medium having pattern correction program recorded therein Physics 6 Expired
US7546178B2 Aligner evaluation system, aligner evaluation method, a computer program product, and a method for manufacturing a semiconductor device Physics 6 Active
US7934175B2 Parameter adjustment method, semiconductor device manufacturing method, and recording medium Electricity 5 Active
US7788626B2 Pattern data correction method, pattern checking method, pattern check program, photo mask producing method, and semiconductor device manufacturing method Physics 5 Active
US7895541B2 Semiconductor integrated circuit pattern verification method, photomask manufacturing method, semiconductor integrated circuit device manufacturing method, and program for implementing semiconductor integrated circuit pattern verification method Physics 4 Active
US7600213B2 Pattern data verification method, pattern data creation method, exposure mask manufacturing method, semiconductor device manufacturing method, and computer program product Emerging Cross-Sectional Technologies 4 Active
US7008731B2 Method of manufacturing a photomask and method of manufacturing a semiconductor device using the photomask Physics 3 Expired
US8402407B2 Semiconductor integrated circuit pattern verification method, photomask manufacturing method, semiconductor integrated circuit device manufacturing method, and program for implementing semiconductor integrated circuit pattern verification method Physics 3 Active
US9953126B2 Method of wiring layout, semiconductor device, program for supporting design of wiring layout, and method for manufacturing semiconductor device Electricity 3 Active
US8078996B2 Method and system for correcting a mask pattern design Physics 3 Active
US7890908B2 Method for verifying mask pattern data, method for manufacturing mask, mask pattern verification program, and method for manufacturing semiconductor device Physics 2 Active
US10943048B2 Defect inspection apparatus and defect inspection method Physics 2 Active
US7229721B2 Method for evaluating photo mask and method for manufacturing semiconductor device Physics 2 Expired
US7793252B2 Mask pattern preparation method, semiconductor device manufacturing method and recording medium Physics 2 Active
US7730445B2 Pattern data verification method for semiconductor device, computer-readable recording medium having pattern data verification program for semiconductor device recorded, and semiconductor device manufacturing method Physics 2 Active
US7794897B2 Mask pattern correcting method, mask pattern inspecting method, photo mask manufacturing method, and semiconductor device manufacturing method Physics 2 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.