Real time monitoring simultaneous imaging and exposure in charged particle beam systems
US6649919B2 · kind B2 · utility
21Cited by
5References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 20, 2001 |
| Grant date | Nov 18, 2003 |
| Priority date | — |
| Expiry date | Nov 4, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3175
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A beam processing system, such as a focused ion beam or an electron beam system, addressing an arbitrary series of points and receives data from the points in real time. The data can be used to image or to alter the processing, even within a single dwell period, thereby allowing closed feedback loop for processing. A delay calculator automatically determines the delay between instructing the system to move the beam and detecting a signal from the work piece surface so that the detector signal can be matched with the location on the work piece at which the signal was generated.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.