Patent · US Expired

Integrated process tool monitoring system for semiconductor fabrication

US6650958B1 · kind B1 · utility

8Cited by
8References
13Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 30, 2002
Grant dateNov 18, 2003
Priority date
Expiry dateOct 30, 2022

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02P90/02
  • WIPO fieldControl
  • WIPO sectorInstruments

Abstract

An integrated process tool monitoring system for semiconductor fabrication. Specifically, a process tool parameter auditing system, where a process tool user need not run a different verification system for each process tool type used and need not download parameters every time before a semiconductor device or material is to be processed by the process tool.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.