Integrated process tool monitoring system for semiconductor fabrication
US6650958B1 · kind B1 · utility
8Cited by
8References
13Claims
0Family size
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Key dates
| Filing date | Oct 30, 2002 |
| Grant date | Nov 18, 2003 |
| Priority date | — |
| Expiry date | Oct 30, 2022 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P90/02
- WIPO fieldControl
- WIPO sectorInstruments
Abstract
An integrated process tool monitoring system for semiconductor fabrication. Specifically, a process tool parameter auditing system, where a process tool user need not run a different verification system for each process tool type used and need not download parameters every time before a semiconductor device or material is to be processed by the process tool.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.