Photomask, aberration correction plate, exposure apparatus, and process of production of microdevice
US6653024B1 · kind B1 · utility
18Cited by
8References
30Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 10, 2000 |
| Grant date | Nov 25, 2003 |
| Priority date | — |
| Expiry date | May 10, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70866
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photomask including a substrate comprised of fluorite (calcium fluoride (CaF2)) and protective films comprised of chrome (Cr), chromium oxide (Cro), silicon oxide (SiO2 or SiO), etc. and formed at regions, other than the pattern region where the pattern to be transferred is formed, which contact other members when transporting the photomask or using it for exposure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.