Nonstick layer for a micromechanical component

US6656368B2 · kind B2 · utility

Assignee

• Robert Bosch GmbH · DE

Inventors

• Martin Schoefthaler · Reutlingen, DE
• Peter Hein · Bamberg, DE
• Helmut Skapa · Reutlingen, DE
• Horst Muenzel · Reutlingen, DE

Key dates

• Filing date: Mar 2, 2000
• Grant date: Dec 2, 2003
• Expiry date: Mar 2, 2020

Classification

• Technology area (CPC B): Performing Operations; Transporting
• CPC primary: B81C2201/112
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

A method for manufacturing micromechanical components, and a micromechanical component, in which a movable element is produced on a sacrificial layer. In a subsequent step the sacrificial layer beneath the movable element is removed so that the movable element becomes movable. After removal of the sacrificial layer, a protective layer is deposited on a surface of the movable element. Silicon oxide and/or silicon nitride is used for the protective layer.