Resist composition suitable for short wavelength exposure and resist pattern forming method
US6656659B1 · kind B1 · utility
11Cited by
2References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 18, 1998 |
| Grant date | Dec 2, 2003 |
| Priority date | — |
| Expiry date | Apr 13, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/111
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A resist composition has a polymer containing a carboxyl group with a protective group at a side chain of a monomer unit, the polymer being insoluble to basic aqueous solution and becoming soluble to basic aqueous solution when the protective group of the carboxyl group is eliminated from the side chain, the protective group of the carboxyl group being represented by: where R is a hydrogen atom or a single-bonded hydrocarbon group, n is an integer 1 to 4, and R is bonded to a position other than the ester bonded position.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.