Resist composition
US6656660B1 · kind B1 · utility
26Cited by
10References
2Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 27, 2000 |
| Grant date | Dec 2, 2003 |
| Priority date | — |
| Expiry date | Jan 27, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/106
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A resist composition comprising (a) at least two kinds of polymers which become alkali-soluble by the action of an acid, (b) as a photoacid generator, a combination of an alkylsulfonyl diazomethane compound and a triarylsulfonium arylsulfonate compound or a diaryliodonium arylsulfonate compound, and (c) a solvent is excellent as a chemically amplified resist composition to give excellent pattern shape and very fine line-and-space, particularly when exposed to lights having a wavelength of 300 nm or less.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.