Apparatus for optically characterising thin layered material
US6657708B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 25, 2001 |
| Grant date | Dec 2, 2003 |
| Priority date | — |
| Expiry date | Sep 25, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/656
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The invention concerns an apparatus for optically characterising a thin-layer material by backscattering Raman spectometry comprising a frame, a monochromatic excitation laser source (21), optical means (23, 24) directing a light flux emitted by the source towards the material to be characterised, provided with means (22) homogenising the distribution of energy per surface unit, over a minimum surface of some tens of square micrometers, and means for collecting (24) and selecting (27, 28) the light diffused by Raman effect. The apparatus further comprises reflectometric measuring means (3-14) integral with the Raman measuring means, including reflectometric excitation means (3-9) directed on the same sample zone as the Raman excitation means.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.