Simulation-based feed forward process control
US6658640B2 · kind B2 · utility
62Cited by
15References
15Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Dec 26, 2001 |
| Grant date | Dec 2, 2003 |
| Priority date | — |
| Expiry date | Feb 11, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70625
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of optimizing a wafer fabrication process for a given mask is provided. The method includes capturing an image of a mask and simulating a wafer image of the mask. A mask map of information can then be generated based on the simulated wafer image. The resulting mask map can be provided to any downstream wafer fabrication process when such process involves the mask. One or more one input parameters to the downstream wafer fabrication process can be changed based on the mask map, thereby optimizing the process for the given mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.