Electron-optical system and inspection method using the same
US6661008B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 21, 1999 |
| Grant date | Dec 9, 2003 |
| Priority date | — |
| Expiry date | Jun 21, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2817
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An electron-optical system, including irradiation means which irradiates a surface of a sample with an irradiating electron beam and observation means which focuses an observational electron beam emitted from the surface of the sample as an image on electron beam detection means. The observation means includes a plurality of electrodes. The electron-optical system further includes an accelerating electric field disposed between the surface of the sample and at least one of the plurality of electrodes so that the sample is biased to a negative potential, and so that the velocity of the observational electron beam that has just been emitted from the surface of the sample increases monotonically to a positive potential. The velocity of the observational electron beam that has been accelerated to the positive potential is reduced to the ground potential by another of the plurality of electrodes which form the observation means.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.