Screening mask having a stress-relieving area

US6662718B2 · kind B2 · utility

Assignee

• International Business Machines Corporation · US

Inventors

• Evelyn Barrington · Poughkeepsie, US
• Jeffrey A. Brody · Hopewell Junction, US
• Harry D. Cox · Rifton, US
• Lorraine Di Piero-Simmonds · Beacon, US
• John J. Garant · Poughkeepsie, US
• Dinesh Gupta · Hopewell Junction, US
• Edward J. Hassdenteufel, III · New Windsor, US
• Hsichang Liu · Fishkill, US
• Paul G. McLaughlin · Poughkeepsie, US
• Ahmed Sayeed Shah · Wappingers Falls, US
• Charles T. Ryan · Poughkeepsie, US
• Richard C. Steger · New Windsor, US
• John A. Trumpetto · Hopewell Junction, US

Key dates

• Filing date: Jun 29, 2001
• Grant date: Dec 16, 2003
• Expiry date: Dec 18, 2021

Classification

• Technology area (CPC B): Performing Operations; Transporting
• CPC primary: B41C1/14
• WIPO field: Textile and paper machines
• WIPO sector: Mechanical engineering

Abstract

A screening mask having a stress-relieving area including an inner functional area having a pattern which is replicated on an underlying substrate, the inner functional area pattern having an one open area through which a paste is extruded and at least one tab, and an outer nonfunctional area distinct from the inner functional area, the outer nonfunctional area having a stress-relieving area adjacent to an edge of the screening mask that protects the at least one tab in the inner functional area from breaking.