Exposure apparatus and device manufacturing method
US6665046B2 · kind B2 · utility
35Cited by
7References
49Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 14, 2001 |
| Grant date | Dec 16, 2003 |
| Priority date | — |
| Expiry date | Aug 10, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70883
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A scan type exposure apparatus for transferring an image of a pattern formed on a mask onto a substrate by synchronously scanning the mask and the substrate in a scanning direction. The apparatus includes a movable stage for holding a substrate thereon, an optical system through which an exposure light path extends, a cover member for encircling the exposure light path, from an end of the optical system toward the stage, and a gas supplying port for discharging an inactive gas into the cover member, wherein the gas is supplied at a predetermined angle with respect to the scan direction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.