Interferometric patterning for lithography
US6671054B2 · kind B2 · utility
3Cited by
2References
25Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Feb 7, 2002 |
| Grant date | Dec 30, 2003 |
| Priority date | — |
| Expiry date | Apr 25, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70408
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Production of interference patterns from incoherent light sources by using an optical filter, a field mirror, and a plane mirror. The optical filter is designed to filter incoherent light waves and generate coherent light waves. The field mirror is arranged to convert the coherent light waves into plane waves. The plane mirror is arranged as a Lloyd's mirror to generate interference patterns from the plane waves.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.