Pattern formation method and method and apparatus for production of a semiconductor device using said method
US6673526B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 23, 1995 |
| Grant date | Jan 6, 2004 |
| Priority date | — |
| Expiry date | Aug 23, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70283
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A pattern formation method and method and apparatus for production of a semiconductor device using that method which irradiate light from a light source to a phase shifting mask through a fly's-eye lens comprised of an assembly of a plurality of lenses, transfer the pattern of the phase shifting mask onto the substrate, and form the pattern on the substrate, wherein the amount of light made incident upon the center portion of the fly's-eye lens is lowered by 2 to 90 percent, preferably 10 to 90 percent, further preferably 20 to 80 percent or 20 to 60 percent, relative to the amount of light incident upon the peripheral portion of the fly's-eye lens.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.