Substrate coated with an MgO layer
US6676814B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 13, 2000 |
| Grant date | Jan 13, 2004 |
| Priority date | — |
| Expiry date | Oct 13, 2020 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C2218/155
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for manufacturing a display panel substrate has the steps of flowing a working gas along and out of a slit defined between two sputtering targets of Mg and toward the substrate thereby selecting the purity of the Mg material of the targets to be at least 99% and thereby blowing sputtered-off material out of the slit and toward the substrate. Introduction, in an area between the slit and the substrate, of a reactive gas containing oxygen, follows, and reacting the sputtered-off material with the reactive gas results in depositing on the substrate, an MgO layer. The method also includes setting the temperature of the substrate during the coating process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.