Scanning wheel for ion implantation process chamber
US6677594B1 · kind B1 · utility
6Cited by
6References
18Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 10, 2000 |
| Grant date | Jan 13, 2004 |
| Priority date | — |
| Expiry date | Mar 10, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31701
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A scan wheel for an ion implanter. The scan wheel having a plurality of wafer support elements each having an elastomer layer 7 on which a wafer is supported. Each wafer support element 3 has a plurality of spring loaded plungers 10 of a material having a lower coefficient of friction than that of the elastomer layer 7 so as to support a wafer such that it can be slid across the wafer support element 3 without sticking to the elastomer layer 7. A position detector 33 can be provided on a gripper which mounts each wafer on a wafer support element to detect that the wafer has been correctly positioned.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.