Shallow trench isolation step height detection method
US6677766B2 · kind B2 · utility
2Cited by
3References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 26, 2001 |
| Grant date | Jan 13, 2004 |
| Priority date | — |
| Expiry date | Dec 8, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/34
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method for measuring the step height of a STI structure is described. The method involves measuring the change in resistance of a polysilicon structure as the step height changes. The resistance of the polysilicon structure is measured by applying a voltage and measuring the resulting current.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.