Method and apparatus for mechanically masking a workpiece
US6680774B1 · kind B1 · utility
57Cited by
4References
16Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Oct 9, 2001 |
| Grant date | Jan 20, 2004 |
| Priority date | — |
| Expiry date | Oct 9, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/707
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of, and apparatus for, mechanically masking a workpiece to form exposure exclusion regions is disclosed. The apparatus includes a mask that is arranged atop the photosensitive surface of the workpiece. The mask is opaque to the wavelength of radiation that activates the photosensitive workpiece surface. The mask is placed onto the workpiece prior to lithographic exposure of the workpiece so that the photosensitive material (e.g., negative acting photoresist) can be removed from select regions of the workpiece to provide, for example, electrical contact directly to the workpiece upper surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.