Patent · US Expired

Dual-wavelength X-ray reflectometry

US6680996B2 · kind B2 · utility

39Cited by

8References

34Claims

0Family size

Assignee

Jordan Valley Applied Radiation Ltd. · IL

Inventors

Boris Yokhin · Mashhad, IL
Isaac Mazor · Haifa, IL
Amos Gvirtzman · Mashhad, IL

Key dates

Filing date	Feb 19, 2002
Grant date	Jan 20, 2004
Priority date	—
Expiry date	Jun 28, 2022

Classification

Technology area (CPC G)Physics
CPC primaryG01N23/20
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

A method for testing a surface includes finding respective first and second critical angles for total external reflection of radiation from an area of the surface at first and second wavelengths. The first and second critical angles are compared to determine an orientation of a tangent to the surface in the area.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.