Patent · US Expired

Method for characterizing the planarizing properties of an expendable material combination in a chemical-mechanical polishing process; simulation technique; and polishing technique

US6682398B2 · kind B2 · utility

6Cited by
13References
11Claims
0Family size

Assignee

Inventor

Key dates

Filing dateJul 29, 2002
Grant dateJan 27, 2004
Priority date
Expiry dateJul 29, 2022

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB24B37/042
  • WIPO fieldMachine tools
  • WIPO sectorMechanical engineering

Abstract

A method for characterizing planarizing properties of a selected expendable material combination in a chemical-mechanical polishing process includes steps of: providing a combination of expendable materials including a softcloth and a polishing agent; providing test substrates with test patterns with different feature densities; performing a polishing process for each of the test substrates while the respective combination of the values for the processing parameters (pressure and velocity) is maintained until saturation is achieved; determining a characteristic quantity for the global grade level from the test substrates that have been polished; and determining expendable material parameters that characterize the planarizing properties for the selected expendable material combination from a functional relationship between the characteristic quantity for the global grade level to a quotient of the relative velocity and the pressure for each one of the test substrates.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.