Microloading effect correction
US6684382B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Aug 31, 2001 |
| Grant date | Jan 27, 2004 |
| Priority date | — |
| Expiry date | Dec 10, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/68
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method and apparatus for providing correction for microloading effects is described. Hybrid proximity correction techniques are used to make the problem computationally more feasible. More specifically, feature edges in a layout can be grouped into those edges, or edge segments, with a large edge separation (group B), e.g. greater than n, and those having less than that separation (group A). The group B features can then be corrected for microloading effects rapidly using rules based correction. Then both groups of edges can be corrected using model based optical proximity correction using the output of the rule based correction as the ideal, or reference, layout.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.