Plasma treatment of processing gases
US6685803B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 22, 2001 |
| Grant date | Feb 3, 2004 |
| Priority date | — |
| Expiry date | Mar 31, 2022 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02C20/30
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The present invention provides a DBD cell (500) including ring shaped electrodes (512 and 514) that are positioned side-by-side on a dielectric tube (516). An AC power supply (518) is provided such that the cell and the power supply form a DBD treatment device (540) for abatement of noxious gases for example FCs that can be discharged from semiconductor fabricating devices. Additionally, one or more sensors (822) and/or one or more gas addition ports (816) can be included in a DBD cell (800) of the present invention. Several DBD cells (1030, 1036 and 1042) of the present invention can be combined to form a DBD reactor (1010) of the present invention. AC power supplies (1012, 1014 and 1016) are utilized to energize the cells (1030, 1036 and 1042).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.