Patent · US Expired

Fused silica pellicle

US6686103B2 · kind B2 · utility

1Cited by
36References
4Claims
0Family size

Assignee

Inventor

Key dates

Filing dateDec 18, 2002
Grant dateFeb 3, 2004
Priority date
Expiry dateDec 18, 2022

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F1/62
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A fused silica pellicle for use on photomasks having increased durability and improved transmission uniformity and birefringence properties. The pellicle may be secured to the photomask using an adhesive or a slide rail system, or may be held in place using a static charge.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.