Patent · US Expired

Multifunctional polymeric materials and use thereof

US6686124B1 · kind B1 · utility

32Cited by
7References
31Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 14, 2000
Grant dateFeb 3, 2004
Priority date
Expiry dateMar 14, 2020

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03C1/733
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A multifunctional polymer comprising a polymeric chain having chromophore groups and cross-linking sites is suitable as a resist material and especially as the underlayer for bilayer and top surface imaging strategies. The multifunctional polymer can function as an antireflective coating, planarizing layer or etch resistant hard mask.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.