Apparatus for inspecting mask
US6686591B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 31, 2002 |
| Grant date | Feb 3, 2004 |
| Priority date | — |
| Expiry date | Jul 26, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2817
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An electronic beam transmitting through a mask is detected by a detector in which a plurality of elements is aligned in a plurality of lines while an image signal is transferred by the detector synchronously with movement of the mask, and high resolution due to a short wavelength of the electronic beam can be effectively utilized as well as an image signal is transferred at right angles to a line of the detector synchronously with same time detection of pixels in a direction of the line, so that an inspection of a mask with high resolution at high speed would be achieved, and furthermore, it would be achieved to produce an image scanned in a straight line with the extremely high accuracy without zigzag scan when a stage with an easy structure is used.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.