Process monitoring system for lithography lasers

US6687562B2 · kind B2 · utility

Assignee

• Cymer, LLC · US

Inventors

• Parthiv Patel · Sayla, IN
• Joseph Conway · El Cajon, US
• Muljadi Tantra · Pleasanton, US
• Jeffrey W. Moen · Oceanside, US
• Jason R. Carlesi · San Diego, US
• Roger Green · Charlotte, US
• Tom A. Watson · Carlsbad, US
• Christopher Rowan · Coronado, US

Key dates

• Filing date: Dec 8, 2000
• Grant date: Feb 3, 2004
• Expiry date: May 5, 2022

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y02P90/80
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A system for a monitoring lithography lasers at integrated circuit fabrication plants. Each laser at each fabrication plant has associated with it a terminal server. With respect to each fabrication plant a central control server unit is in communication with each of the lasers through a local area network. Information from the lasers is collected by the central control server unit and the information is used to provide summary information which is made available in a web site format to interested parties having access authorization.