Ion beam incidence angle and beam divergence monitor
US6690022B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 16, 2002 |
| Grant date | Feb 10, 2004 |
| Priority date | — |
| Expiry date | Jun 23, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3171
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A device for measuring an incidence angle of an ion beam impinging a planar substrate includes an aperture plate having an aperture for intercepting the ion beam and passing a beam portion therethrough, and a sensor located in the substrate plane or a plane parallel thereto behind the aperture plate and having a length along which the beam portion impinges on the sensor at a location which is a function of the incidence angle of the ion beam, the sensor configured to produce a sensor signal indicative of the location of impingement of the beam portion on the sensor and representative of incidence angle. A computing unit may be configured to compare the sensor signal to a predetermined function for determining the incidence angle of the ion beam. Spaced apart sensing devices may be used to determine beam divergence.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.