Morgan Evans
88Patents
7h-index
86Co-inventors
75Inventor score
Filing activity: Jan 16, 2002 → Jun 26, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8815720B2 | Method of etching a workpiece | Electricity | 99 | Active |
| US7176470B1 | Technique for high-efficiency ion implantation | Electricity | 22 | Expired |
| US6690022B2 | Ion beam incidence angle and beam divergence monitor | Electricity | 16 | Expired |
| US10302826B1 | Controlling etch angles by substrate rotation in angled etch tools | Electricity | 11 | Active |
| US7755066B2 | Techniques for improved uniformity tuning in an ion implanter system | Electricity | 10 | Active |
| US9287148B1 | Dynamic heating method and system for wafer processing | Electricity | 10 | Active |
| USD825912S1 | Crutches | General | 8 | Active |
| US7355188B2 | Technique for uniformity tuning in an ion implanter system | Electricity | 7 | Active |
| US10775158B2 | System and method for detecting etch depth of angled surface relief gratings | Physics | 6 | Active |
| US10823888B1 | Methods of producing slanted gratings with variable etch depths | Physics | 6 | Active |
| US10935799B2 | Optical component having depth modulated angled gratings and method of formation | Physics | 5 | Active |
| US7663125B2 | Ion beam current uniformity monitor, ion implanter and related method | Electricity | 5 | Active |
| US10690821B1 | Methods of producing slanted gratings | Electricity | 5 | Active |
| US11247298B2 | Method of forming a plurality of gratings | Physics | 4 | Active |
| US7342240B2 | Ion beam current monitoring | Electricity | 4 | Active |
| US11119405B2 | Techniques for forming angled structures | Electricity | 3 | Active |
| US11226441B2 | Methods of producing slanted gratings with variable etch depths | Physics | 2 | Active |
| US10598832B2 | System and method for forming diffracted optical element having varied gratings | Physics | 2 | Active |
| US9633886B2 | Hybrid thermal electrostatic clamp | Electricity | 2 | Active |
| US7521691B2 | Magnetic monitoring of a Faraday cup for an ion implanter | Electricity | 2 | Active |
| US10607847B1 | Gate all around device and method of formation using angled ions | Electricity | 2 | Active |
| US9933314B2 | Semiconductor workpiece temperature measurement system | Electricity | 2 | Active |
| US10795173B2 | System and method for optimally forming gratings of diffracted optical elements | Physics | 2 | Active |
| US11715621B2 | Scanned angled etching apparatus and techniques providing separate co-linear radicals and ions | Electricity | 2 | Active |
| US8906727B2 | Heteroepitaxial growth using ion implantation | Chemistry; Metallurgy | 2 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.