Sputtering target and method for making composite soft magnetic films
US6692619B1 · kind B1 · utility
6Cited by
10References
20Claims
0Family size
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Key dates
| Filing date | Feb 8, 2002 |
| Grant date | Feb 17, 2004 |
| Priority date | — |
| Expiry date | Feb 8, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3405
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A high-saturation magnetization composite soft magnetic film can be deposited by magnetron co-sputtering of two or more kinds of materials using targets which have a lower saturation magnetization than that of a single target, which otherwise will be used to produce the resulting composite soft magnetic film. The composite film has a substantially uniform composition and thickness.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.