Method and apparatus for avoiding driver gas contamination in an ion implanter gas supply module
US6696689B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Aug 10, 2001 |
| Grant date | Feb 24, 2004 |
| Priority date | — |
| Expiry date | Dec 4, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31701
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A gaseous supply system and method for operating the same is disclosed for supplying at least one gaseous source material to an ion source chamber for use with an ion implanter including at least one gas supply module in gaseous communication with an ion source chamber including at least one pneumatic valve to control the delivery of at least one gaseous source material to the ion source chamber for generation of source material ions for implantation including a driver gas source in communication with said at least one pneumatic valve for operating the at least one pneumatic valve said driver gas source having a different atomic mass unit than the source material ions for implantation generated from the at least one gaseous source material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.