Lu Chen
13Patents
3h-index
29Co-inventors
56Inventor score
Filing activity: Aug 10, 2001 → Jun 1, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8223327B2 | Systems and methods for detecting defects on a wafer | Physics | 21 | Active |
| US8605275B2 | Detecting defects on a wafer | Electricity | 18 | Active |
| US8467047B2 | Systems and methods for detecting defects on a wafer | Physics | 5 | Active |
| US9880107B2 | Systems and methods for detecting defects on a wafer | Physics | 3 | Active |
| US10605744B2 | Systems and methods for detecting defects on a wafer | Physics | 2 | Active |
| US6696689B2 | Method and apparatus for avoiding driver gas contamination in an ion implanter gas supply module | Electricity | 1 | Expired |
| US6722022B2 | Apparatus for calibrating the position of a wafer platform in an ion implanter | Emerging Cross-Sectional Technologies | 1 | Expired |
| US9347891B2 | Wafer and reticle inspection systems and methods for selecting illumination pupil configurations | Physics | 1 | Active |
| US11680313B2 | Selective deposition on non-metallic surfaces | Electricity | 1 | Active |
| US11939666B2 | Methods and apparatus for precleaning and treating wafer surfaces | Electricity | 0 | Active |
| US9523646B2 | Wafer and reticle inspection systems and methods for selecting illumination pupil configurations | Physics | 0 | Active |
| US10930550B2 | Barrier for copper metallization and methods of forming | Chemistry; Metallurgy | 0 | Active |
| US6605812B1 | Method reducing the effects of N2 gas contamination in an ion implanter | Electricity | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.