Beam positioning in microlithography writing
US6700600B1 · kind B1 · utility
12Cited by
3References
30Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 17, 2002 |
| Grant date | Mar 2, 2004 |
| Priority date | — |
| Expiry date | May 17, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/704
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention relates to a system and a method for microlithographic writing and inspection on photosensitive substrates, and specially printing and inspection of patterns with extremely high precision, such as photomasks for semiconductor device patterns, display panels, integrated optical, devices and electronic interconnect structures. More specifically the invention relates to compensation of substrate offset by modifying the position data or the feeding of the same of the deflector, and the use of a direct digital synthesis (DDS) unit for generation of the sweep frequency drive signal.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.