Methods and systems for controlling critical dimension (CD) error
US6700950B1 · kind B1 · utility
6Cited by
3References
43Claims
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Key dates
| Filing date | Oct 31, 2002 |
| Grant date | Mar 2, 2004 |
| Priority date | — |
| Expiry date | Oct 31, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70625
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Methods and systems for controlling critical dimension (CD) in a process system, including computing an exposure dose error based on at least one output of the process system, normalizing the computed exposure dose error based on a target exposure dose, and providing an exposure dose to the process system based on at least one normalized exposure dose error. The target exposure dose can be associated with a process system characteristic(s) and can be updated based on normalized computed exposure dose errors.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.