Method and apparatus for VHF plasma processing with load mismatch reliability and stability
US6703080B2 · kind B2 · utility
203Cited by
6References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 20, 2002 |
| Grant date | Mar 9, 2004 |
| Priority date | — |
| Expiry date | May 20, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/46
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A radio frequency (RF) generator apparatus for a plasma processing system that is resistant to nonlinear load mismatch conditions is provided. The apparatus includes an RF oscillator configured to generate an RF signal, an RF amplifier responsive to the RF signal to produce a VHF RF signal having sufficient power to drive a plasma chamber load, and a VHF-band circulator coupled to the amplifier and configured to isolate nonlinearities of the plasma chamber load from the amplifier.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.